The IR microscope acquires transmission images for optical, non-contact and non-destructive 2D analysis of structures in NIR transparent materials. Typical applications are the analysis of hidden structures in semiconductor and sapphire wafers, glasses, as well as coatings.
The IR microscope has a particularly powerful industrial camera with a highly sensitive 1.3 megapixel CMOS sensor. Besides its outstanding sensitivity to NIR, the sensor has a range of distinctive features. For example, the sensor provides a rolling shutter mode for extremely low-noise, high-contrast images. By an automatic hotpixel correction defective pixels are corrected. The USB 3.0 camera also provides a 128 MB image memory and a frame rate of 60 fps at full resolution. A manually-adjustable cold-light source with reflective halogen lamp, stepless brightness control and glass fiber optic cable is used for sample illumination.
The innovative illumination concept of the MicroProf® DI makes a variety of defect types visible and detects local failures, inclusions and other defects regardless of their position. The MicroProf® DI includes several modules that can be flexibly combined on the same tool platform, covering all wafer surfaces at high throughput for efficient process control. The modules include: optical inspection and classification of defects via single-shot and step module, review of defects via a high-precision microscope and comprehensive multi-sensor metrology with different topography and layer thickness sensors. For the optical, non-contact and non-destructive 2D analysis of hidden structures and inclusions in the wafer, interferometric layer thickness sensors with infrared light source and an IR microscope are also available.
Learn more about the MicroProf® DI here.
The degree of automation goes from integration into manually operated measuring tools, which automatically run predefined programs, to fully automated wafer handling including automatic pre- and fine alignment. FRT tools can be configured to handle SEMI compliant and non-conforming wafers often used in the MEMS industry.
For semiconductor applications FRT offers its own class of tools for clean room manufacturing. These measuring tools can process 200 mm and 300 mm wafers in one system (FOUP, SMIF and open wafer cassettes are possible). The included SEMI compliant software package enables interactive or automated use, easy creation of measurement and evaluation recipes as well as integration into existing production control systems via the SECS/GEM interface.
Whether for laboratory, development, quality assurance or production - FRT offers the right measurement technology for your application. Our experts will be glad to support you in solving your measurement tasks by creating the best possible system configuration for you.
[Translate to English:] IR-Mikroskop